Design survey of x-ray/XUV projection lithography systems

David L. Shealy; Vriddhachalam K. Viswanathan

doi:10.1117/12.23195

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1 February 1991 Design survey of x-ray/XUV projection lithography systems

David L. Shealy, Vriddhachalam K. Viswanathan

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Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23195
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

Several configurations of two- to four-multilayer mirror systems that have been proposed for use in soft-X-ray projection lithography are examined. The performance capabilities of spherical and aspherical two-mirror projection systems are compared, and a two-spherical-mirror four-reflection system that can resolve 0.1-micron features over a 10 x 10 mm field is described. It is emphasized that three-mirror systems show promise of high resolution in telescope applications, but have not been fully analyzed for projection lithography applications. It has been shown that a four-mirror aspheric system can be designed to meet the resolution requirements, but a trade-off must be made between reducing distortion below 10 microns over the field of view and increasing the modulation transfer function greater than 50 percent at spatial frequency of 5000 cycles/mm.

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David L. Shealy and Vriddhachalam K. Viswanathan "Design survey of x-ray/XUV projection lithography systems", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23195

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