Interface characterization of XUV multilayer reflectors using HRTEM and x-ray and XUV reflectance

David L. Windt; Robert Hull; Warren K. Waskiewicz; Jeffrey B. Kortright

doi:10.1117/12.23202

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1 February 1991 Interface characterization of XUV multilayer reflectors using HRTEM and x-ray and XUV reflectance

David L. Windt, Robert Hull, Warren K. Waskiewicz, Jeffrey B. Kortright

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Proceedings Volume 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography; (1991) https://doi.org/10.1117/12.23202
Event: 34th Annual International Technical Symposium on Optical and Optoelectronic Applied Science and Engineering, 1990, San Diego, CA, United States

Abstract

The structure of XUV multilayer coatings has been examined using high-resolution transmission electron microscopy. A variety of techniques have been used to measure the interface widths and the interface topography from the digitized TEM images and the results have been compared with X-ray and XUV reflectance measurements. It is found that the structural parameters measured from the TEM images and those deduced from reflectance are consistent in light of the probable systematic errors associated with the measurement and interpretation techniques.

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David L. Windt, Robert Hull, Warren K. Waskiewicz, and Jeffrey B. Kortright "Interface characterization of XUV multilayer reflectors using HRTEM and x-ray and XUV reflectance", Proc. SPIE 1343, X-Ray/EUV Optics for Astronomy, Microscopy, Polarimetry, and Projection Lithography, (1 February 1991); https://doi.org/10.1117/12.23202

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