Empirical Statistics For Yield Map Analysis

Peter S. Gwozdz

doi:10.1117/12.956126

6 September 1978 Empirical Statistics For Yield Map Analysis

Peter S. Gwozdz

Proceedings Volume 0135, Developments in Semiconductor Microlithography III; (1978) https://doi.org/10.1117/12.956126
Event: Developments in Semiconductor Microlithography III, 1978, San Jose, United States

Abstract

Yield maps provide a powerful tool for the location and analysis of mask defects. The routine use of yield maps has not been widely accepted due to the requirement for involved statistical computations. Empirically justified approximations are derived for simple, quick yield map analysis. The physical significance of these approximations is discussed both graphically and heuristically.

Citation Download Citation

Peter S. Gwozdz "Empirical Statistics For Yield Map Analysis", Proc. SPIE 0135, Developments in Semiconductor Microlithography III, (6 September 1978); https://doi.org/10.1117/12.956126

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available