Epitaxial growth of gallium arsenide from elemental arsenic

Ting L. Chu; Shirley S. Chu; Richard F. Green; C. L. A. Cerny

doi:10.1117/12.24416

1 March 1991 Epitaxial growth of gallium arsenide from elemental arsenic

Ting L. Chu, Shirley S. Chu, Richard F. Green, C. L. A. Cerny

Proceedings Volume 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization; (1991) https://doi.org/10.1117/12.24416
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany

Abstract

Epitaxial gallium arsenide (GaAs) films of controlled electrical properties are essential for the fabrication of high performance devices. Metalorganic vapor phase epitaxy (MOVPE) utilizing the reaction of trimethylgallium (TMGa) or triethylgallium (TEGa) and arsine (AsH3) is commonly used for the epitaxial growth of GaAs. The use of highly toxic AsH3 however is a serious hazard in research and manufacturing operations. In this work the MOVPE of device quality GaAs from elemental arsenic has been demonstrated for the first time thus minimizing a major safety concern. The reaction of TEGa and As on the substrate surface at 450-550C in a H2 flow was used. The parameter of the growth process and the electrical and photoluminescent properties of epitaxial GaAs are discussed. Further TMGa TEGa and arsenic show strong absorption in far ultraviolet. The epitaxial growth of GaAs films can be achieved at low substrate temperatures by irradiating the gaseous reactant with a UV laser. Epitaxial GaAs films have been grown at 425C or higher by using ArF laser enhanced reaction of TEG and As. The electrical and photoluminescent properties of these films have also beencharacterized. Epitaxial GaAs films grown by the laser enhanced process have been found to contain considerably higher carbon concentration than films grown by the thermal process. This is due presumably to the photodissociation of carbon-hydrogen bonds in TEGa.

Citation Download Citation

Ting L. Chu, Shirley S. Chu, Richard F. Green, and C. L. A. Cerny "Epitaxial growth of gallium arsenide from elemental arsenic", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); https://doi.org/10.1117/12.24416

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
6 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Gallium arsenide

Arsenic

Carbon

Laser processing

Pulsed laser operation

Hydrogen

Manufacturing

Show All Keywords

Keywords/Phrases

Search In:

Publication Years