Monolithic epitaxial IV-VI compound IR-sensor arrays on Si substrates for the SWIR, MWIR and LWIR range

Hans Zogg; Jiri Masek; Clau Maissen; Taizo J. Hoshino; Stefan Blunier; A. N. Tiwari

doi:10.1117/12.24344

1 March 1991 Monolithic epitaxial IV-VI compound IR-sensor arrays on Si substrates for the SWIR, MWIR and LWIR range

Hans Zogg, Jiri Masek, Clau Maissen, Taizo J. Hoshino, Stefan Blunier, A. N. Tiwari

Proceedings Volume 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization; (1991) https://doi.org/10.1117/12.24344
Event: Physical Concepts of Materials for Novel Optoelectronic Device Applications, 1990, Aachen, Germany

Abstract

Fabrication of infrared sensor arrays in epitaxial lead-salt layers on Si are described with PbS, PbTe and Pb1SnSe for the SWIR, MWIR and LWIR range. Epitaxy of the 2-3 jim thick layers is obtained with the aid of a 200 nm thick stacked CaF2-BaF2 buffer. Linear arrays with 66 elements were fabricated. For the LWIR range, an array with 10.5 jim cut-off wavelength at 77K and spread below 0. 1 im demonstrates the superior homogeneity achievable with IV-VI materials compared to MCT. The mean quantum efficiency of this array is 59% with 3% standard deviation of the individual sensors.

Citation Download Citation

Hans Zogg, Jiri Masek, Clau Maissen, Taizo J. Hoshino, Stefan Blunier, and A. N. Tiwari "Monolithic epitaxial IV-VI compound IR-sensor arrays on Si substrates for the SWIR, MWIR and LWIR range", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); https://doi.org/10.1117/12.24344

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