Paper
1 March 1991 Semiconductor-doped glass as a nonlinear material
Burkhard Speit, K. E. Remitz, Norbert N. Neuroth
Author Affiliations +
Abstract
We report on a systematic study of the growth of high quality films of GaAs on Si substrates for co-integration in optical interconnects. The effort was geared towards optimizing substrate preparation, growth time parameters and post-growth treatment for best active layer properties. In particular, the study of growth involved optimization of chemical substrate preparation, study of silicon substrate orientation, ex-situ and in-situ treatment, as well as multi- layer and silicon buffer layers. For quantification of film quality, a number of characterization methods were used both in-situ (RHEED, Auger) and ex-situ (Optical, Electrical (I-V, C-V, DLTS), Hall, ThM, SEM, ECP, XRD). Schottky Diodes, p-n heterojunctions and MSM Photoconductors/ Photodetectors (PC/PD's) were fabricated on these films. A comprehensive study was performed on the PC/PD's, chosen as the test optoelectronic device, for maximum photosensitivity and minimum leakage current. The results allow us to claim that we have achieved a technology that leads to heteroepitaxial GaAs/Si films which compare to homoepitaxial GaAs/GaAs within about 10% in performance in most areas relevant to optoeleclxonic devices. In addition, a reduction of a processing temperature by 100°C was achieved.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Burkhard Speit, K. E. Remitz, and Norbert N. Neuroth "Semiconductor-doped glass as a nonlinear material", Proc. SPIE 1361, Physical Concepts of Materials for Novel Optoelectronic Device Applications I: Materials Growth and Characterization, (1 March 1991); https://doi.org/10.1117/12.24355
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Cited by 2 scholarly publications.
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KEYWORDS
Glasses

Semiconductors

Absorption

Optoelectronic devices

Ions

Microcrystalline materials

Modulators

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