Photochemical formation of polymeric optical waveguides and devices for optical interconnection applications

Karl W. Beeson; Keith A. Horn; Michael J. McFarland; Chengjiu Wu; James T. Yardley

doi:10.1117/12.24969

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1 February 1991 Photochemical formation of polymeric optical waveguides and devices for optical interconnection applications

Karl W. Beeson, Keith A. Horn, Michael J. McFarland, Chengjiu Wu, James T. Yardley

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Proceedings Volume 1374, Integrated Optics and Optoelectronics II; (1991) https://doi.org/10.1117/12.24969
Event: SPIE Microelectronic Interconnect and Integrated Processing Symposium, 1990, San Jose, United States

Abstract

The formation of both passive and active optical waveguide structures in thin films of organic polymers by a direct one-step photochemical process is reported. A photochemical transformation changes the chemical composition of a polymer of dye/polymer mixture. The reaction modifies the absorption spectrum of the material and thus alters its index of refraction. This technique is used to create waveguide structures both by spatially-selected laser direct writing and contact mask exposure. It is demonstrated that passive and active waveguide structures can be delineated in thin films of organic polymers by photochemically altering the index of refraction of the materials. The formation of single or multimode devices is possible using standard lithographic procedures which are suitable for mass production.

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Karl W. Beeson, Keith A. Horn, Michael J. McFarland, Chengjiu Wu, and James T. Yardley "Photochemical formation of polymeric optical waveguides and devices for optical interconnection applications", Proc. SPIE 1374, Integrated Optics and Optoelectronics II, (1 February 1991); https://doi.org/10.1117/12.24969

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