Excimer lasers for deep-UV lithography

David J. Elliott; Uday K. Sengupta

doi:10.1117/12.25017

1 March 1991 Excimer lasers for deep-UV lithography

David J. Elliott, Uday K. Sengupta

Proceedings Volume 1377, Excimer Laser Materials Processing and Beam Delivery Systems; (1991) https://doi.org/10.1117/12.25017
Event: Advances in Intelligent Robotics Systems, 1990, Boston, MA, United States

Abstract

Krypton Fluoride exciTner laser-based wafer steppers are now expected to extend optical microlithography to sub-0. 5pra design rules in VLSI chip fabrication. The performance and operational requireraents for the excinter laser for this application are very stringent and different from conventional excimer lasers. For practical reasons the stepper requires that the spectral bandwidth of the laser be reduced to less than 3pm while the wavelength is stabilized to better than +/0. Spm. This paper will discuss these issues and the design features of such an excimer laser. This paper also addresses issues relating to the integration of this laser with a wafer stepper and operation in a wafer fabricatio''n environment

Citation Download Citation

David J. Elliott and Uday K. Sengupta "Excimer lasers for deep-UV lithography", Proc. SPIE 1377, Excimer Laser Materials Processing and Beam Delivery Systems, (1 March 1991); https://doi.org/10.1117/12.25017

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