Vertical 3-D integration of silicon waveguides in a Si-SiO2-Si-SiO2-Si structure

Richard A. Soref; Fereydoon Namavar; Elisabetta Cortesi; Lionel R. Friedman; Richard Lareau

doi:10.1117/12.25543

1 April 1991 Vertical 3-D integration of silicon waveguides in a Si-SiO₂-Si-SiO₂-Si structure

Richard A. Soref, Fereydoon Namavar, Elisabetta Cortesi, Lionel R. Friedman, Richard Lareau

Proceedings Volume 1389, Microelectronic Interconnects and Packages: Optical and Electrical Technologies; (1991) https://doi.org/10.1117/12.25543
Event: Advances in Intelligent Robotics Systems, 1990, Boston, MA, United States

Abstract

We have built and tested new multiple-layer silicon optical waveguide structures that have applications in wafer-scale optical interconnects. A repeated sequence of oxygen implantation annealing and Si epitaxy was used to make 5-layer or 6-layer structures containing a pair of 2- jim-thick Si waveguide cores separated by 1200A or 3700A of Si02. Coupled or uncoupled dual waveguiding at 1. 3 xm was observed. Inter-guide coupling for this stacked 3-D structure is analyzed here. Applications to all-silicon guided-wave optical interconnects are discussed.

Citation Download Citation

Richard A. Soref, Fereydoon Namavar, Elisabetta Cortesi, Lionel R. Friedman, and Richard Lareau "Vertical 3-D integration of silicon waveguides in a Si-SiO₂-Si-SiO₂-Si structure", Proc. SPIE 1389, Microelectronic Interconnects and Packages: Optical and Electrical Technologies, (1 April 1991); https://doi.org/10.1117/12.25543

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