Multichamber rapid thermal processing

Paul J. Rosser; P. Moynagh; Kevin B. Affolter

doi:10.1117/12.25691

1 April 1991 Multichamber rapid thermal processing

Paul J. Rosser, P. Moynagh, Kevin B. Affolter

Proceedings Volume 1393, Rapid Thermal and Related Processing Techniques; (1991) https://doi.org/10.1117/12.25691
Event: Processing Integration, 1990, Santa Clara, CA, United States

Abstract

Silicon processing makes ever-increasing demands on the capabilities and quality of processing equipment. Rapid thermal processing (RTP) enables the use of thermally activated processes with the minimum thermal budget. Multi-chamber systems minimise turn around time whilst providing a high quality processing environment. This paper seeks to identify the issues associated with the use of RTP in multi-chamber systems from the reasons for considering it to the further work required to optimise it. 1.

Citation Download Citation

Paul J. Rosser, P. Moynagh, and Kevin B. Affolter "Multichamber rapid thermal processing", Proc. SPIE 1393, Rapid Thermal and Related Processing Techniques, (1 April 1991); https://doi.org/10.1117/12.25691

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available