Highly damage-resistant reflectors for 248 nm formed by fluorides multilayers

Takao Izawa; N. Yamamura; R. Uchimura; I. Hashimoto; T. Yakuoh; Yoshiro Owadano; Yuji Matsumoto; M. Yano

doi:10.1117/12.57242

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1 June 1991 Highly damage-resistant reflectors for 248 nm formed by fluorides multilayers

Takao Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Yoshiro Owadano, Yuji Matsumoto, M. Yano

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Proceedings Volume 1441, Laser-Induced Damage in Optical Materials: 1990; (1991) https://doi.org/10.1117/12.57242
Event: Laser-Induced Damage in Optical Materials: 1990, 1990, Boulder, CO, United States

Abstract

we investigated the laser damage thresholds and optical performances of fluorides multi-layered reflectors, consisting of middle index fluoride and Na3AlF, for high power KrF laser applications. It was found the damage thresholds of those reflectors are significantly improved by laser annealing. Those reflectors with annealing resisted against the fluence of 18-27 J/cm2 (this fluence varies on combinations of various fluorides) for 248 n, 15 nsec, 10Hz pulses.

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Takao Izawa, N. Yamamura, R. Uchimura, I. Hashimoto, T. Yakuoh, Yoshiro Owadano, Yuji Matsumoto, and M. Yano "Highly damage-resistant reflectors for 248 nm formed by fluorides multilayers", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); https://doi.org/10.1117/12.57242

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