Thermal analysis of multifacet-mirror ring resonator for XUV free-electron lasers

Brian D. McVey; John C. Goldstein; Robert D. McFarland; Brian Emerson Newnam

doi:10.1117/12.57237

1 June 1991 Thermal analysis of multifacet-mirror ring resonator for XUV free-electron lasers

Brian D. McVey, John C. Goldstein, Robert D. McFarland, Brian Emerson Newnam

Proceedings Volume 1441, Laser-Induced Damage in Optical Materials: 1990; (1991) https://doi.org/10.1117/12.57237
Event: Laser-Induced Damage in Optical Materials: 1990, 1990, Boulder, CO, United States

Abstract

xUv (10 nm -100 nm) free-electron lasers (EELs) are potentially important light sources for advanced lithography and materials applications. The average power of an XUV EEL oscillator may be urnited by thermal loading of the resonator mirrors. We analyze the requirements for the thennal performance of the mirrors of a metal multifacet-mirror ring resonator for use at 12 nm. We use analytical methods and numerical approaches which include simulations with the 3-D EEL code FELEX. Thermal distortion of mirror surfaces leads to optical wavefront aberrations which reduce the focusability of the light beam in the gain medium (wiggler/electron beam) and limit the laser performance.

Citation Download Citation

Brian D. McVey, John C. Goldstein, Robert D. McFarland, and Brian Emerson Newnam "Thermal analysis of multifacet-mirror ring resonator for XUV free-electron lasers", Proc. SPIE 1441, Laser-Induced Damage in Optical Materials: 1990, (1 June 1991); https://doi.org/10.1117/12.57237

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