Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers

Hans-Juergen Kahlert; Ulrich Rebhan; Peter Lokai; Dirk Basting

doi:10.1117/12.44818

1 July 1991 Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers

Hans-Juergen Kahlert, Ulrich Rebhan, Peter Lokai, Dirk Basting

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44818
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Since 1987 commercial line narrowed 248 nm excimer lasers have been used with R&D DUV steppers. Several resonator concepts were employed to match linewidth power and lifetime needs for a DUV microlithography laser light source. The physics of different line narrowing resonators like prisms, grating, etalons and combinations are described and experimental lifetime and power capabilities reviewed. The directions of DUV-laser light source development are discussed in regard to 193 and 157 nm lithography.

Citation Download Citation

Hans-Juergen Kahlert, Ulrich Rebhan, Peter Lokai, and Dirk Basting "Comparison of 248-nm line narrowing resonator optics for deep-UV lithography lasers", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44818

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