Excimer laser photolithography with a 1:1 broadband catadioptric optics

Yudong Zhang; Dunwu Lu; Haixing Zou; ZhiJiang Wang

doi:10.1117/12.44804

1 July 1991 Excimer laser photolithography with a 1:1 broadband catadioptric optics

Yudong Zhang, Dunwu Lu, Haixing Zou, ZhiJiang Wang

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44804
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Design and construction of a deep-UV projection lens for use in sub-micron excimer laser lithography is reported. Its spectral band is wide enough for an unnarrowed excimer laser used as an illumination source.

Citation Download Citation

Yudong Zhang, Dunwu Lu, Haixing Zou, and ZhiJiang Wang "Excimer laser photolithography with a 1:1 broadband catadioptric optics", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44804

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