Selected performance parameters and functional principles of a new stepper generation

Karl-Heinz Kliem; Volker Sczepanski; Uwe Michl; Reiner Hesse

doi:10.1117/12.44828

1 July 1991 Selected performance parameters and functional principles of a new stepper generation

Karl-Heinz Kliem, Volker Sczepanski, Uwe Michl, Reiner Hesse

Proceedings Volume 1463, Optical/Laser Microlithography IV; (1991) https://doi.org/10.1117/12.44828
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

Modern wafer stepper generations are capable of realizing higher circuit levels due to high-performance lenses in the WV region, but at the same time there is also the necessity of designing assembly groups of the wafer stepper so that they meet the requirements of a wide assortment range in modem device fabrication. Long years of practical experience in the use of steppers enabled Jenoptik to implement an new generation of wafer steppers, in which particular value was placed on the instrumental improvement of the paramemters: - internal thermostatting/minimum particle contamination - alignment accuracy - useful depth of focus.

Citation Download Citation

Karl-Heinz Kliem, Volker Sczepanski, Uwe Michl, and Reiner Hesse "Selected performance parameters and functional principles of a new stepper generation", Proc. SPIE 1463, Optical/Laser Microlithography IV, (1 July 1991); https://doi.org/10.1117/12.44828

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