Paper
1 July 1991 Effect of operating points in submicron CD measurements
Mircea V. Dusa, Christoph Jung, Paul Jung, Detlef Hogenkamp, Klaus-Dieter Roeth
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Abstract
A new measuring method was developed to optimize the submicron CD measurements with a conventional optical microscope system. An optimum combination of the inspection system optical parameters is used to accurately and precisely measure each feature of interest. Such combinations are considered to define the 'operating points' for the new measuring method. Also, the slope of the logarithm of the image intensity profile was determined to be an appropriate metric of aerial image quality in order to predict the operating points number and their placement. This paper discusses the experimental results obtained in measuring 0.75 micrometers isolated spaces with the proposed method and the construction of the operating points for this feature, with the measured linewidth data.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mircea V. Dusa, Christoph Jung, Paul Jung, Detlef Hogenkamp, and Klaus-Dieter Roeth "Effect of operating points in submicron CD measurements", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44457
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KEYWORDS
Inspection

Edge detection

Image processing

Integrated optics

Metrology

Integrated circuits

Optical inspection

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