Optical metrology for integrated circuit fabrication

Stanley S. C. Chim; Gordon S. Kino

doi:10.1117/12.44430

1 July 1991 Optical metrology for integrated circuit fabrication

Stanley S. C. Chim, Gordon S. Kino

Proceedings Volume 1464, Integrated Circuit Metrology, Inspection, and Process Control V; (1991) https://doi.org/10.1117/12.44430
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A new tool for optical metrology, the Mirau Correlation Microscope (MCM), it introduced. The basic principle of this device is to employ an interference microscope with a temporally and spatially incoherent illumination source, and to use as the detected output the interference signal between the beams reflected from the object and from a reference mirror, respectively. Phase images and cross-sectional images of integrated circuits are obtained. Critical dimension measurements on photoresist linewidths are demonstrated and features with sizes down to 0.4 micrometers have been measured consistently.

Citation Download Citation

Stanley S. C. Chim and Gordon S. Kino "Optical metrology for integrated circuit fabrication", Proc. SPIE 1464, Integrated Circuit Metrology, Inspection, and Process Control V, (1 July 1991); https://doi.org/10.1117/12.44430

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