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1 August 1991 Multilayer optics for soft x-ray projection lithography: problems and prospects
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Abstract
The current state-of-the-art in multilayer x-ray optics is presented, and the specific problems posed by projection lithography are considered. To make soft x-ray projection lithography a viable technology, the multilayer optics must demonstrate both high normal incidence reflectivity and long-term stability in the potential hostile lithography environment.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Daniel Gorman Stearns, Natale M. Ceglio, Andrew M. Hawryluk, Robert S. Rosen, and Stephen P. Vernon "Multilayer optics for soft x-ray projection lithography: problems and prospects", Proc. SPIE 1465, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing, (1 August 1991); https://doi.org/10.1117/12.47345
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