Studies of dissolution inhibition mechanism of DNQ-novolak resist (II): effect of extended ortho-ortho bond in novolak

Kenji Honda; Bernard T. Beauchemin Jr.; Edward A. Fitzgerald III; Alfred T. Jeffries III; Sobhy P. Tadros; Andrew J. Blakeney; Rodney J. Hurditch; Shiro Tan; Shinji Sakaguchi

doi:10.1117/12.46365

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1 June 1991 Studies of dissolution inhibition mechanism of DNQ-novolak resist (II): effect of extended ortho-ortho bond in novolak

Kenji Honda, Bernard T. Beauchemin Jr., Edward A. Fitzgerald III, Alfred T. Jeffries III, Sobhy P. Tadros, Andrew J. Blakeney, Rodney J. Hurditch, Shiro Tan, Shinji Sakaguchi

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Proceedings Volume 1466, Advances in Resist Technology and Processing VIII; (1991) https://doi.org/10.1117/12.46365
Event: Microlithography, 1991, San Jose, CA, United States

Abstract

A p-cresol trimer sequence was incorporated into a polymeric chain of novolak by copolymerization with m-cresol of a reactive precursor which was prepared by attaching two units of m-cresol to the terminal ortho positions of p-cresol trimer. The resulting novolak was characterized by 13C NMR and FTIR in an attempt to correlate novolak structure with dissolution inhibition function based on physicochemical analysis of molecular interactions between novolak and DNQ-PAC in solid films.

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Kenji Honda, Bernard T. Beauchemin Jr., Edward A. Fitzgerald III, Alfred T. Jeffries III, Sobhy P. Tadros, Andrew J. Blakeney, Rodney J. Hurditch, Shiro Tan, and Shinji Sakaguchi "Studies of dissolution inhibition mechanism of DNQ-novolak resist (II): effect of extended ortho-ortho bond in novolak", Proc. SPIE 1466, Advances in Resist Technology and Processing VIII, (1 June 1991); https://doi.org/10.1117/12.46365

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