Expert system for diagnosis/optimization of microlithography process*

Dan V. Nicolau; Florin Fulga; Mircea V. Dusa

doi:10.1117/12.45478

1 March 1991 Expert system for diagnosis/optimization of microlithography process*

Dan V. Nicolau, Florin Fulga, Mircea V. Dusa

Proceedings Volume 1468, Applications of Artificial Intelligence IX; (1991) https://doi.org/10.1117/12.45478
Event: Orlando '91, 1991, Orlando, FL, United States

Abstract

The paper present the assumptions which were taken into consideration when building an Expert System for Microlithography (ExSyM), and describes this Expert System which has 'learning', 'teaching' and 'answering' functions.

Citation Download Citation

Dan V. Nicolau, Florin Fulga, and Mircea V. Dusa "Expert system for diagnosis/optimization of microlithography process*", Proc. SPIE 1468, Applications of Artificial Intelligence IX, (1 March 1991); https://doi.org/10.1117/12.45478

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