Investigation of process sensitivity for electron-beam evaporation of beryllium

Charles M. Egert; D. D. Schmoyer; C. W. Nordin; A. Berry

doi:10.1117/12.46524

1 September 1991 Investigation of process sensitivity for electron-beam evaporation of beryllium

Charles M. Egert, D. D. Schmoyer, C. W. Nordin, A. Berry

Proceedings Volume 1485, Reflective and Refractive Optical Materials for Earth and Space Applications; (1991) https://doi.org/10.1117/12.46524
Event: Orlando '91, 1991, Orlando, FL, United States

Abstract

A statistical-design-of-experiments approach is here adopted to investigate the process sensitivity of an evaporative Be-coating technique as a function of its process parameters: deposition rate, substrate temperature, and run time. A total of 18 coating runs was used to produce Be coatings on Al, Si, fused silica, and Be substrates, and these were then characterized by SEM, IR spectrophotometry, stylus profilometry, and weight gain. On the basis of the results obtained, a functional relationship is developed between quality-related characteristics and evaporation-process parameters; the process sensitivity for each response is then ascertained by calculating the gradient of each such characteristic relative to all three process parameters.

Citation Download Citation

Charles M. Egert, D. D. Schmoyer, C. W. Nordin, and A. Berry "Investigation of process sensitivity for electron-beam evaporation of beryllium", Proc. SPIE 1485, Reflective and Refractive Optical Materials for Earth and Space Applications, (1 September 1991); https://doi.org/10.1117/12.46524

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