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1 September 1991 Laser plasma XUV sources: a role for excimer lasers?
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Proceedings Volume 1503, Excimer Lasers and Applications III; (1991) https://doi.org/10.1117/12.46950
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands
Abstract
Radiative characteristics of laser-plasma XUV sources are reviewed. The dependence of the main plasma parameters on the heating laser wavelength is discussed, as well as the use of application-specific excimer lasers to generate XUV radiation. A comparison is given with other XUV sources, such as electron storage rings. Examples of the application of normal- incidence multilayer XUV optics, e.g., to collimate the laser-plasma radiation or for projection lithography, are given.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Fred Bijkerk and Alexander P. Shevelko "Laser plasma XUV sources: a role for excimer lasers?", Proc. SPIE 1503, Excimer Lasers and Applications III, (1 September 1991); https://doi.org/10.1117/12.46950
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