Characterization of micro-optical components fabricated by deep-etch x-ray lithography

Jost Goettert; Juergen Mohr

doi:10.1117/12.45972

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1 August 1991 Characterization of micro-optical components fabricated by deep-etch x-ray lithography

Jost Goettert, Juergen Mohr

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Proceedings Volume 1506, Micro-Optics II; (1991) https://doi.org/10.1117/12.45972
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands

Abstract

Deep-etch x-ray lithography allows the fabrication of micro-optical components with critical lateral dimensions of a few micrometers and structural heights up to several hundred micrometers. Using interferometric methods, the structural tolerances of the side walls of fabricated microstructures are shown to be about 0.3 micrometers per 300 micrometers of structural height. A parallel HeNe laser beam is easily passed through several microprisms, which is evidence for the high precision achievable in positioning micro-optical components on a baseplate. Focussing a light beam by cylinder lenses is also possible. The free two- dimensional shape and the high precision achievable in positioning allow fabrication of micro- optical components with integrated fiber fixing grooves in which multi-mode fibers are precisely positioned. Simple fiber connectors, e.g., fiber forks or Y-couplers, can be achieved. By using a light-guiding resist system, divergence losses can be diminished.

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Jost Goettert and Juergen Mohr "Characterization of micro-optical components fabricated by deep-etch x-ray lithography", Proc. SPIE 1506, Micro-Optics II, (1 August 1991); https://doi.org/10.1117/12.45972

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