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1 August 1991 Ion beam modification of glasses
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Proceedings Volume 1513, Glasses for Optoelectronics II; (1991) https://doi.org/10.1117/12.46022
Event: ECO4 (The Hague '91), 1991, The Hague, Netherlands
Abstract
This paper presents a review of the effects induced by ion implantation in silica glass and in SiO2 films on silicon with particular emphasis on optical modifications and new compound formation. The formation of silicon oxynitrides and nitrogen oxides in surface layers as a consequence of nitrogen implantation was investigated by using different techniques as XPS, SIMS, and optical methods.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Paolo Mazzoldi, Alberto Carnera, Frederico Caccavale, G. Granozzi, R. Bertoncello, Giancarlo Battaglin, A. Boscolo-Boscoletto, and Piero Polato "Ion beam modification of glasses", Proc. SPIE 1513, Glasses for Optoelectronics II, (1 August 1991); https://doi.org/10.1117/12.46022
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