Formation of Si02 film on plastic substrate by liquid-phase-deposition method

Masaki Kitaoka; Hisao Honda; Harunobu Yoshida; Akio Takigawa; Hideo Kawahara

doi:10.1117/12.47296

1 November 1991 Formation of Si0₂ film on plastic substrate by liquid-phase-deposition method

Masaki Kitaoka, Hisao Honda, Harunobu Yoshida, Akio Takigawa, Hideo Kawahara

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47296
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

The silicon dioxide (SiO₂) film deposition on a plastic was made by liquid phase deposition (LPD) method. This process involves the deposition and growth of SiO₂ layer on the plastic while immersing it in the hexafluorosilicic acid (H₂SiF₆) solution supersaturated with silica. In this study, it was shown that the specific pretreatment of the plastic surface by silane coupling agent was required for better adhesion of the SiO₂ film. And the SiO₂ film properties, resistance of organic solvent, water vapor permeability and water absorptivity, were evaluated in order to apply the 'LPD-SiO₂' film to the protective layer of the polycarbonate (PC) disk for optical memory. As a result, it was shown that the 'LPD-SiO₂' film could improve the properties of the plastic substrate.

Citation Download Citation

Masaki Kitaoka, Hisao Honda, Harunobu Yoshida, Akio Takigawa, and Hideo Kawahara "Formation of Si0₂ film on plastic substrate by liquid-phase-deposition method", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47296

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