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1 November 1991In-situ low-temperature and epitaxial growth of high-Tc superconducting films using oxygen-discharge-assisted laser ablation method
High Tc superconducting films with zero resistance temperature of 91 K and critical current density about 105 A/cm2 at 77 K have been reproductively fabricated using oxygen discharge plasma-assisted excimer laser ablation method. Scanning electron micrographs and x-ray diffraction patterns of the films showed that these kinds of in situ prepared films had excellent epitaxial quality with its C axis oriented perpendicular to the substrate surface.
Yongchang Fan,Chengwu An,Dongsheng Lu, andZaiguang Li
"In-situ low-temperature and epitaxial growth of high-Tc superconducting films using oxygen-discharge-assisted laser ablation method", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47238
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Yongchang Fan, Chengwu An, Dongsheng Lu, Zaiguang Li, "In-situ low-temperature and epitaxial growth of high-Tc superconducting films using oxygen-discharge-assisted laser ablation method," Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47238