New ion-beam sources and their applications to thin film physics

David T. Wei; Harold R. Kaufman

doi:10.1117/12.47248

1 November 1991 New ion-beam sources and their applications to thin film physics

David T. Wei, Harold R. Kaufman

Proceedings Volume 1519, International Conference on Thin Film Physics and Applications; (1991) https://doi.org/10.1117/12.47248
Event: International Conference on Thin Film Physics and Applications, 1991, Shanghai, China

Abstract

The development of ion sources for thin film coatings and modifications in the past decade are reviewed. Recent applications for optics and microelectronics are discussed.

Citation Download Citation

David T. Wei and Harold R. Kaufman "New ion-beam sources and their applications to thin film physics", Proc. SPIE 1519, International Conference on Thin Film Physics and Applications, (1 November 1991); https://doi.org/10.1117/12.47248

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