Removal rates of fused silica with cerium oxide/pitch polishing

Aleta A. Tesar; Baruch A. Fuchs

doi:10.1117/12.134876

1 January 1992 Removal rates of fused silica with cerium oxide/pitch polishing

Aleta A. Tesar, Baruch A. Fuchs

Proceedings Volume 1531, Advanced Optical Manufacturing and Testing II; (1992) https://doi.org/10.1117/12.134876
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

The polishing removal rates of fused silica under 20 test conditions have been characterized by the resulting Preston coefficients and an inspection of surface quality using a Nomarski microscope and an optical heterodyne profilometer. Preston coefficient values of > 16 X 10-14 cm3/dyne-cm have been established, approximately a factor of 10 higher than cited previously. However, operational variables can reduce removal rates significantly. Process parameters are shown to have an effect on surface quality that has been related to surface deposits. The effects of chemical additives on removal rates were of special interest. Of importance here is not necessarily the introduction of such additives in practice. The results may improve our understanding of the chemistry of polishing.

Citation Download Citation

Aleta A. Tesar and Baruch A. Fuchs "Removal rates of fused silica with cerium oxide/pitch polishing", Proc. SPIE 1531, Advanced Optical Manufacturing and Testing II, (1 January 1992); https://doi.org/10.1117/12.134876

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