New technique for characterizing holographic recording materials

Philippe E.L.G. Leclere; Yvon L. M. Renotte; Yves F. Lion

doi:10.1117/12.50680

1 December 1991 New technique for characterizing holographic recording materials

Philippe E.L.G. Leclere, Yvon L. M. Renotte, Yves F. Lion

Proceedings Volume 1559, Photopolymer Device Physics, Chemistry, and Applications II; (1991) https://doi.org/10.1117/12.50680
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

In this paper, we present a methodology for analyzing the characteristics of a photosensitive material for holography. When two Gaussian beams of equal intensities are exactly superimposed on the recording material, the modulation of the interference pattern is equal to unity. When they are no longer exactly superimposed, this modulation varies from one to zero depending on the analyzed point. On the other hand, the modulation is constant in a direction perpendicular to the incident plane. Therefore, it is possible to consider a complete analysis (point by point) of only one holographic grating in order to measure the diffraction efficiency (eta) at a given modulation versus exposure or for varying modulation for a given exposure. We present the results obtained with an experimental setup devised for that purpose. The tested recording material is a film of dichromated poly(-vinyl alcohol) (DC-PVA).

Citation Download Citation

Philippe E.L.G. Leclere, Yvon L. M. Renotte, and Yves F. Lion "New technique for characterizing holographic recording materials", Proc. SPIE 1559, Photopolymer Device Physics, Chemistry, and Applications II, (1 December 1991); https://doi.org/10.1117/12.50680

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