Photochemistry and fluorescence spectroscopy of polymeric materials containing triphenylsulfonium salts

Nigel P. Hacker; Kevin M. Welsh

doi:10.1117/12.50664

1 December 1991 Photochemistry and fluorescence spectroscopy of polymeric materials containing triphenylsulfonium salts

Nigel P. Hacker, Kevin M. Welsh

Proceedings Volume 1559, Photopolymer Device Physics, Chemistry, and Applications II; (1991) https://doi.org/10.1117/12.50664
Event: San Diego, '91, 1991, San Diego, CA, United States

Abstract

Triphenylsulfonium salts (TPS) have been formulated with polymers to make photosensitive systems for optical and optoelectronic applications. Photolysis of these salts generates strong acid which has been used in cross-linking reactions, deprotection reactions, and depolymerization reactions for photosensitive polymers, photodeformable polymers, and photo-doped conducting polymers. In addition, materials best described as polymeric sulfonium salts have been found to become conducting after photolysis. We have studied the photochemistry of TPS in polymer films and in solution. TPS photodecomposes by a mechanism that gives both in-cage recombination reactions and cage-escape products, and by reaction with solvent or polymer matrix. These products give cage/escape (C/E) ratios which are sensitive to the viscosity, rigidity, and polarity of the environment, and also the excited state from which the photochemistry occurs. Details of the reactivity and C/E ratios from photolysis of TPS salts in solution, have made it possible to determine their reactivity in polymers. In some cases the polymer behaves as a viscous solvent leading to high C/E ratios and in other systems the polymer excited state can sensitize the decomposition of TPS salts to give lower C/E ratios. Fluorescence studies on these polymers and quenching studies with TPS salts have helped to determine which excited states of the polymer and TPS salts are involved, and whether there is static or dynamic quenching in these systems. The photochemistry of model compounds for the polymeric sulfonium salts is also described.

Citation Download Citation

Nigel P. Hacker and Kevin M. Welsh "Photochemistry and fluorescence spectroscopy of polymeric materials containing triphenylsulfonium salts", Proc. SPIE 1559, Photopolymer Device Physics, Chemistry, and Applications II, (1 December 1991); https://doi.org/10.1117/12.50664

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available