Processing issues and technologies for optoelectronics-integrated circuits and devices (invited)

G. Allen Vawter

doi:10.1117/12.2321800

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1 December 1992 Processing issues and technologies for optoelectronics-integrated circuits and devices (invited)

G. Allen Vawter

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Proceedings Volume 1582, Integrated Optoelectronics for Communication and Processing; (1992) https://doi.org/10.1117/12.2321800
Event: OE Fiber, 1991, Boston, MA, United States

Abstract

The influence of processing on the design of optical devices and optoelectronic integrated circuits is discussed. Process compatibility of devices used as the basis of a complete optoelectronic integrated circuit will be discussed along with some potential optoelectronic integrated circuits employing only phase modulators and couplers. Specific examples of the application of reactive-ion-beam etching in the formation of passive optical waveguide phase modulators, optical interconnects, turning mirrors, and output couplers in GaAs/AlGaAs are given.

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G. Allen Vawter "Processing issues and technologies for optoelectronics-integrated circuits and devices (invited)", Proc. SPIE 1582, Integrated Optoelectronics for Communication and Processing, (1 December 1992); https://doi.org/10.1117/12.2321800

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