Photolithographic processing of integrated optic devices in glasses

Edgar A. Mendoza; Harry D. Gafney; David L. Morse

doi:10.1117/12.50907

1 December 1991 Photolithographic processing of integrated optic devices in glasses

Edgar A. Mendoza, Harry D. Gafney, David L. Morse

Proceedings Volume 1583, Integrated Optical Circuits; (1991) https://doi.org/10.1117/12.50907
Event: OE Fiber, 1991, Boston, MA, United States

Abstract

The ability to produce changes in the refractive index of a glass of the order of 0.01 to 0.001 allows a laser beam to be guided through glass. However, to perform the functions required for passive elements demands the formation of highly resolved gradient index patterns. Porous glass impregnated with photosensitive organometallic compounds exhibits optical changes when exposed to light. Changes in transmission and refractive index can be induced and are permanent after consolidation of the glass. Photolithographic techniques for making channel waveguides of the order of 1-10 mm, and more complex optical circuits composed of active and passive components have been developed.

Citation Download Citation

Edgar A. Mendoza, Harry D. Gafney, and David L. Morse "Photolithographic processing of integrated optic devices in glasses", Proc. SPIE 1583, Integrated Optical Circuits, (1 December 1991); https://doi.org/10.1117/12.50907

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