Paper
1 January 1992 Equipment improvement methodology
Kevin Lally
Author Affiliations +
Proceedings Volume 1594, Process Module Metrology, Control and Clustering; (1992) https://doi.org/10.1117/12.56618
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
Today's advanced devices require increasing levels of process complexity. Semiconductor (SC) manufacturers are investigating higher levels of process integration using cluster tools as an approach to decrease process cycle times and increase yields.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin Lally "Equipment improvement methodology", Proc. SPIE 1594, Process Module Metrology, Control and Clustering, (1 January 1992); https://doi.org/10.1117/12.56618
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KEYWORDS
Process control

Data modeling

Manufacturing

Metrology

Error analysis

Instrument modeling

Process modeling

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