Paper
1 December 1991 Excimer laser projector for microelectronics applications
Author Affiliations +
Proceedings Volume 1598, Lasers in Microelectronic Manufacturing; (1991) https://doi.org/10.1117/12.51024
Event: Microelectronic Processing Integration, 1991, San Jose, CA, United States
Abstract
Fully integrated excimer laser mask macro and microprojectors and application workstations that produce on the workpiece illumination uniformities as low as +/-5% with overall energy throughput efficiencies of up to 70% are described.
© (1991) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Phil T. Rumsby and Malcolm C. Gower "Excimer laser projector for microelectronics applications", Proc. SPIE 1598, Lasers in Microelectronic Manufacturing, (1 December 1991); https://doi.org/10.1117/12.51024
Lens.org Logo
CITATIONS
Cited by 7 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Excimer lasers

Projection systems

Microelectronics

Photomasks

Image resolution

Pulsed laser operation

Objectives

RELATED CONTENT

Laser processes for repair of thin-film wiring
Proceedings of SPIE (December 01 1991)
KrF laser ablation of polyurethane
Proceedings of SPIE (December 01 1991)
Routes To Half-Micron Lithography
Proceedings of SPIE (January 01 1988)
High repetition rate excimer laser
Proceedings of SPIE (March 01 2006)
193 nm deep UV lithography system using a line narrowed...
Proceedings of SPIE (August 08 1993)

Back to Top