New look at incoming pellicle inspection

Robert W. Murphy; James A. Reynolds

doi:10.1117/12.56940

1 January 1992 New look at incoming pellicle inspection

Robert W. Murphy, James A. Reynolds

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Proceedings Volume 1604, 11th Annual BACUS Symposium on Photomask Technology; (1992) https://doi.org/10.1117/12.56940
Event: 11th Annual BACUS Symposium on Photomask Technology, 1991, Sunnyvale, CA, United States

Abstract

One of the most difficult steps in the photomask process is that of cleaning and pelliclizing a mask or reticle. This must be done in a way that guarantees zero particles in the pellicle volume at the time of pelliclization as well as throughout the life of the reticle. With the advent of 16 and 64 Megabit DRAM processing, the elimination of these particles becomes more important and more difficult. Considerable effort has been expended to perfect cleaning and inspection equipment used to clean the reticle before pelliclization and inspect it afterwards. The incoming pellicle, however, can be an equally large source of defects which can cause a reticle to fail, either in outgoing inspection or after many months of use. This paper deals with several aspects of incoming pellicle inspection. The inspection equipment and techniques used at Apex are described. Defect types are defined with photographs and drawings. The specification gap between the needs of the mask users and the capabilities of pellicle suppliers is discussed. Finally inspection yield data is presented with Pareto analysis showing the beneficial effect of incoming pellicle inspection.

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Robert W. Murphy and James A. Reynolds "New look at incoming pellicle inspection", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); https://doi.org/10.1117/12.56940

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