Laser damage results on planar high-temperature chemical vapor deposition coatings

Raymond M. Brusasco

doi:10.1117/12.60135

29 July 1992 Laser damage results on planar high-temperature chemical vapor deposition coatings

Raymond M. Brusasco

Proceedings Volume 1624, Laser-Induced Damage in Optical Materials: 1991; (1992) https://doi.org/10.1117/12.60135
Event: Laser-Induced Damage in Optical Materials: 1991, 1991, Boulder, CO, United States

Abstract

Experiments in three different RF-based (13.56 MHz) plasma reactors located in the U.S. and two different microwave-based (2.45 GHz) deposition systems located in Europe were conducted and the laser damage threshold results at 1064 nm as well as some uniformity and reflectivity data are given. The RF-based plasma reactors fail to produce multilayers with visible optical interference effects. Microwave-based plasma systems were successful in preparing rugate-type dielectric reflectors with index modulation ((Delta) n) up to 0.034 and reflectivities up to 95%. The laser damage threshold was strongly dependent on reactor geometry. A vertical tube furnace arrangement gave the highest damage thresholds (> 40 J cm^-2) when cylindrical or rectangular cross-section tubes were used. Planar substrate geometries were a factor of 3 to 10 lower. RF-based coating systems were also low (5 to 12 J cm^-2) regardless of the deposition chemistry used or the reactor geometry tried.

Citation Download Citation

Raymond M. Brusasco "Laser damage results on planar high-temperature chemical vapor deposition coatings", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60135

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