Low-pressure reactive dc-magnetron sputter deposition of metal-oxide thin films

Bradley J. Pond; Tu Du; J. Sobczak; Charles K. Carniglia; Forrest L. Williams

doi:10.1117/12.60124

29 July 1992 Low-pressure reactive dc-magnetron sputter deposition of metal-oxide thin films

Bradley J. Pond, Tu Du, J. Sobczak, Charles K. Carniglia, Forrest L. Williams

Author Affiliations +

Proceedings Volume 1624, Laser-Induced Damage in Optical Materials: 1991; (1992) https://doi.org/10.1117/12.60124
Event: Laser-Induced Damage in Optical Materials: 1991, 1991, Boulder, CO, United States

Abstract

Improvements in magnetron sputtering technology have made it possible to deposit compound thin films at total pressures as low as approximately 1 X 10^-4 torr. Deposition at these lower pressures increases the mean free path of molecules within the vacuum chamber, thereby allowing for greater adatom energies on the substrate surface. By increasing adatom energy, low-pressure dc-magnetron sputtering can lead to the deposition of dense metal-oxide films that are resistant to the adsorption of atmospheric water (H₂O). We report results showing improved environmental stability in single-layer films of silica (SiO₂) and alumina (Al₂O₃) deposited using a 8-in-diameter dc magnetron source. Metal targets were used, with argon (Ar) as the sputtering gas and oxygen (O₂) as the reactive gas. The silicon target was doped with 5-percent Al to improve its electrical conductivity. The effects of target voltage, Ar partial pressure, and O₂ partial pressure were studied. In addition, several source geometries were tested in order to optimize the coating thickness uniformity. Film moisture content was characterized by spectral transmittance near the H₂O optical absorption band at 2.8 micrometers . Deposition at total pressures < 3 X 10^-4 torr resulted in SiO₂ coatings with minimal H₂O content, while all Al₂O₃ coatings exhibited no H₂O content.

Citation Download Citation

Bradley J. Pond, Tu Du, J. Sobczak, Charles K. Carniglia, and Forrest L. Williams "Low-pressure reactive dc-magnetron sputter deposition of metal-oxide thin films", Proc. SPIE 1624, Laser-Induced Damage in Optical Materials: 1991, (29 July 1992); https://doi.org/10.1117/12.60124

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