Paper
1 August 1992 Wafer pattern inspection using a Coherent Optical Processor
Xian-Yang Cai, Frank Kvasnik
Author Affiliations +
Proceedings Volume 1661, Machine Vision Applications in Character Recognition and Industrial Inspection; (1992) https://doi.org/10.1117/12.130299
Event: SPIE/IS&T 1992 Symposium on Electronic Imaging: Science and Technology, 1992, San Jose, CA, United States
Abstract
Microscope coherent optical processor (M-COP) has been configured and used to inspect the micro-patterns on a silicon wafer in real time. A technique for the measurement of the scale change of this pattern has been devised. Theoretical and experimental results showing the viability of this technique are presented.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Xian-Yang Cai and Frank Kvasnik "Wafer pattern inspection using a Coherent Optical Processor", Proc. SPIE 1661, Machine Vision Applications in Character Recognition and Industrial Inspection, (1 August 1992); https://doi.org/10.1117/12.130299
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KEYWORDS
Semiconducting wafers

Inspection

Wafer-level optics

Microscopes

Photomasks

Optical filters

Silicon

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