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9 July 1992 Why bother with x-ray lithography?
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The manufacture of state-of-the-art integrated circuits uses UV optical projection lithography. Conventional wisdom (i.e., the trade journals) holds that this technology will take the industry to quarter-micrometer minimum features sizes and below. So, why bother with X-ray lithography? The reason is that lithography is a 'system problem', and proximity X-ray lithography is better matched to that system problem than any other technology, once the initial investment is surmounted. X-ray lithography offers the most cost-effective path to the future of ultra-large-scale integrated circuits with feature sizes of tenth micrometer and below (i.e., gigascale electronics and quantum-effect electronics).
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Henry I. Smith and Mark L. Schattenburg "Why bother with x-ray lithography?", Proc. SPIE 1671, Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (9 July 1992);


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