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1 June 1992 Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis
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Abstract
Many chemically amplified resists based on acid catalysis exhibit extreme sensitivity to trace quantities of airborne organic contaminants. This sensitivity is manifested as a rapid degradation in lithographic properties upon standing in clean room air. In this work we have studied the absorption of one such airborne contaminant, N-methylpyrollidone (NMP), by thin polymer films. NMP labeled with radioactive 14C was introduced at a concentration of 10 ppb into a stream of purified air, and the film of interest was immersed in that airstream for a predetermined time under controlled conditions. This method provides an ideal means for determining rates of NMP uptake, correlating resist lithographic performance with absorbed NMP content, and for examining the effects of film thickness and composition on rates of absorption.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
William D. Hinsberg, Scott A. MacDonald, Nicholas J. Clecak, and Clinton D. Snyder "Quantitation of airborne chemical contamination of chemically amplified resists using radiochemical analysis", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59723
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