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1 June 1992 Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process
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Abstract
The dissolution behavior of films comprising novolak polymers and oligomers having defined structural characteristics has been investigated by means of near-real-time UV and FT-IR spectroscopic measurements. The observed results are correlated with the behavior of practical resists and the solution chemistry of related model compounds in order to provide a better understanding of the mechanism of dissolution inhibition with emphasis on `secondary' reactions occurring during the development process. In particular, evidence is presented for the formation of a stable TMA+/novolate- complex which may influence the dissolution inhibition dependency of the novolak microstructure.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kenji Honda, Bernard T. Beauchemin Jr., Rodney J. Hurditch, Andrew J. Blakeney, and Tadayoshi Kokubo "Studies of dissolution inhibition mechanism of DNQ novolak resists: part III--secondary inhibition with quaternary ammonium salts in development process", Proc. SPIE 1672, Advances in Resist Technology and Processing IX, (1 June 1992); https://doi.org/10.1117/12.59760
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