Novel approach to placement accuracy analysis

Ken'ichi Kawakami

doi:10.1117/12.59793

1 June 1992 Novel approach to placement accuracy analysis

Ken'ichi Kawakami

Proceedings Volume 1673, Integrated Circuit Metrology, Inspection, and Process Control VI; (1992) https://doi.org/10.1117/12.59793
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

This paper presents a new mathematical method to analyze placement errors. Using several Hilbert space principles, we analyze placement errors by decomposing them into basic distortion patterns. The second section discusses overlay error in general and mathematically treats mask distortion. Distortion data is represented as a linear combination of the basic distortion pattern. For typical distortions, these coefficients are shown in section 3. An example of analysis is given in section 4 and the discussions are summarized in section 5.

Citation Download Citation

Ken'ichi Kawakami "Novel approach to placement accuracy analysis", Proc. SPIE 1673, Integrated Circuit Metrology, Inspection, and Process Control VI, (1 June 1992); https://doi.org/10.1117/12.59793

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