Paper
1 June 1992 Design and performance of a production-worthy excimer-laser-based stepper
, Christopher Sparkes, Peter A. DiSessa, David J. Elliott
Author Affiliations +
Abstract
Excimer-laser-based steppers have matured to a production-worthy state. Widefield high-NA lenses have been developed and characterized for imaging down to 0.35 micron and below. Excimer lasers have attained practical levels of performance capability and stability, reliability, safety, and operating cost Excimer stepper system integration and control issues such as focus, exposure, and overlay stability have been addressed. Enabling support technologies - resist systems, resist processing, metrology and conventional mask making - continue to progress and are becoming available. This paper will discuss specific excimer stepper design challenges, and will present characterization data from several field installations of XLS™ deep-UV steppers configured with an advanced lens design.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
, Christopher Sparkes, Peter A. DiSessa, and David J. Elliott "Design and performance of a production-worthy excimer-laser-based stepper", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130362
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Control systems

Semiconducting wafers

Laser stabilization

Overlay metrology

Excimer lasers

Reliability

Optical lithography

Back to Top