Translator Disclaimer
Paper
1 June 1992 High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser
Author Affiliations +
Abstract
The bandwidth requirements 1, 2, 3, 4, 5 on DUV 248 nm lithography laser sources, in general, are a function of a number of physical parameters. For example, the stepper lens, the image field size and the required resolution. The trend towards larger field sizes in new DUV-stepper lenses has resulted in a bandwidth need of below 2 ?m for a lorentzian spectral distribution.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Lokai, Ulrich Rebhan, Uwe Stamm, Hermann Buecher, Hans-Juergen Kahlert, and Dirk Basting "High-spectral-brightness 1.0-pm bandwidth DUV lithography excimer laser", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130371
PROCEEDINGS
12 PAGES


SHARE
Advertisement
Advertisement
Back to Top