Novel process for phase-shifting mask fabrication

Haruhiko Kusunose; Satoshi Aoyama; Kunihiro Hosono; Susumu Takeuchi; Shuichi Matsuda; Maaike Op de Beeck; Nobuyuki Yoshioka; Yaichiro Watakabe

doi:10.1117/12.130323

1 June 1992 Novel process for phase-shifting mask fabrication

Haruhiko Kusunose, Satoshi Aoyama, Kunihiro Hosono, Susumu Takeuchi, Shuichi Matsuda, Maaike Op de Beeck, Nobuyuki Yoshioka, Yaichiro Watakabe

Author Affiliations +

Proceedings Volume 1674, Optical/Laser Microlithography V; (1992) https://doi.org/10.1117/12.130323
Event: Microlithography '92, 1992, San Jose, CA, United States

Abstract

In this new process for phase-shifting mask fabrication, molybdenum silicide (MoSi) is used as an optical shield layer and spin-on glass (SOG) as a phase-shifter layer. Chromium is employed as an etch-stopper during SOG etching. Cr etch-stopper will be removed at the end of tiie process, therefore all optical problems related to an etch-stopper are avoided. This Cr etch-stopper is also useful in inspection and repair of shifter remaining defects. At first, we will describe the fabrication process including the shifter-defect inspection and repair. Secondary, we will discuss the phase-shifting mask accuracy and its influence to the printed resist pattern when using the alternating type phase-shifting mask. Lastly,we will mention the application result of development of lithography for 64Mbit DRAM using this process.

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Haruhiko Kusunose, Satoshi Aoyama, Kunihiro Hosono, Susumu Takeuchi, Shuichi Matsuda, Maaike Op de Beeck, Nobuyuki Yoshioka, and Yaichiro Watakabe "Novel process for phase-shifting mask fabrication", Proc. SPIE 1674, Optical/Laser Microlithography V, (1 June 1992); https://doi.org/10.1117/12.130323

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