Paper
1 July 1992 Optimization of cryogenic CMOS processes for sub-10°K applications
Robert M. Glidden, Steven C. Lizotte, James S. Cable, Larry W. Mason, Chipaul Cao
Author Affiliations +
Abstract
Below approximately 40°K, conventional CMOS technologies show radical departures from room temperature behavior and classical theory, confounding attempts to design readout circuits that have desirable and predictable behavior. Though the effects often seem difficult to explain, they are in all cases due to the effects of carrier freezeout. We have extensively investigated the device properties of CMOS PETs at temperatures very close to absolute zero and conducted a series of process optimizations designed to overcome anomalies that dominate the device behavior. The resulting technology has been used to build readouts for very long wavelength extrinsic silicon detectors, including staring arrays of significant complexity (256x256 pixels). Large die sizes (450 mils) have been produced with high yields (in excess of 50 percent) using this process.
© (1992) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Robert M. Glidden, Steven C. Lizotte, James S. Cable, Larry W. Mason, and Chipaul Cao "Optimization of cryogenic CMOS processes for sub-10°K applications", Proc. SPIE 1684, Infrared Readout Electronics, (1 July 1992); https://doi.org/10.1117/12.60492
Lens.org Logo
CITATIONS
Cited by 22 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Field effect transistors

Oxides

Infrared radiation

Cryogenics

Silicon

Interfaces

Doping

Back to Top