Paper
2 March 1993 Fabrication and replication of radiation-resistant diffractive optical elements
Christel Budzinski, Bernd H. Kleemann
Author Affiliations +
Proceedings Volume 1732, Holographics International '92; (1993) https://doi.org/10.1117/12.140454
Event: Holographics International '92, 1992, London, United Kingdom
Abstract
The trend of the increase of the output energy is obviously as good for UV lasers as for IR lasers. This requires radiation resistant elements, for instance lenses, mirrors, or gratings. Monochromatic radiation can be focused by diffractive optical elements to a diffraction limited focal spot with nearly 100% efficiency. Therefore, diffractive optical elements are well suited for application to industrial laser cutting and welding technology. However, usual holographic gratings are destroyed by an irradiation of a few watts per cm2. To overcome this difficulty electroforming and etching techniques have been developed. We report on the production, calculation, and measurements of efficiency of gratings in copper with grating constants between 0, 5, and 200 micrometers .
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christel Budzinski and Bernd H. Kleemann "Fabrication and replication of radiation-resistant diffractive optical elements", Proc. SPIE 1732, Holographics International '92, (2 March 1993); https://doi.org/10.1117/12.140454
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KEYWORDS
Copper

Diffraction gratings

Diffraction

Diffractive optical elements

Holography

Dielectric polarization

Etching

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