Proximity-compensated kinoforms directly written by electron beam lithography

Mats Ekberg; J. Michael Larsson; Fredrik K. Nikolajeff; Sverker Hard

doi:10.1117/12.140380

2 March 1993 Proximity-compensated kinoforms directly written by electron beam lithography

Mats Ekberg, J. Michael Larsson, Fredrik K. Nikolajeff, Sverker Hard

Proceedings Volume 1732, Holographics International '92; (1993) https://doi.org/10.1117/12.140380
Event: Holographics International '92, 1992, London, United Kingdom

Abstract

We report on direct-writing EBL manufactured, proximity compensated blazed transmission gratings. The proximity compensation is made using a non-linear iterative process in the spatial domain. The diffraction efficiency for a compensated 8 micron period grating was 84%, almost twice that of an uncompensated grating.

Citation Download Citation

Mats Ekberg, J. Michael Larsson, Fredrik K. Nikolajeff, and Sverker Hard "Proximity-compensated kinoforms directly written by electron beam lithography", Proc. SPIE 1732, Holographics International '92, (2 March 1993); https://doi.org/10.1117/12.140380

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