Paper
25 February 1993 Stability tests for soft x-ray multilayers under exposure to multipole-wiggler radiation
Mihiro Yanagihara, Kou Mayama, Seiji Asaoka, Hideki Maezawa
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Abstract
The effect of white wiggler radiation exposure on Mo/BN, W/BN, Mo/B4C, and W/B4C multilayers was evaluated by comparing soft x-ray reflectance at an incidence angle of 45 degree(s). All samples were prepared by magnetron sputtering onto SiC substrates. The choice of combinations was based upon annealing tests for Mo/X and W/X (X equals C, Si, BN, and B4C) multilayers, prior to any exposure tests. The Mo/BN multilayer was found to be the most stable for an exposure time of 10 min under radiation power density of approximately 2.3 W/mm2. The observed reduced reflectance for the Mo/BN and W/BN samples was found to be reducible to a radiation-induced effect on the BN layers.
© (1993) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mihiro Yanagihara, Kou Mayama, Seiji Asaoka, and Hideki Maezawa "Stability tests for soft x-ray multilayers under exposure to multipole-wiggler radiation", Proc. SPIE 1739, High Heat Flux Engineering, (25 February 1993); https://doi.org/10.1117/12.140517
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KEYWORDS
Reflectivity

Annealing

Sputter deposition

Solids

Multilayers

Silicon carbide

X-rays

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