XUV synchrotron optical components for the Advanced Light Source: fabrication and metrology

David L. Lunt; Jonathan W. Bender; Donald G. Ewing; Wayne R. McKinney

doi:10.1117/12.138698

20 January 1993 XUV synchrotron optical components for the Advanced Light Source: fabrication and metrology

David L. Lunt, Jonathan W. Bender, Donald G. Ewing, Wayne R. McKinney

Proceedings Volume 1740, Optics for High-Brightness Synchrotron Radiation Beamlines; (1993) https://doi.org/10.1117/12.138698
Event: San Diego '92, 1992, San Diego, CA, United States

Abstract

Third generation synchrotrons such as the Advanced Light Source impose severe restrictions on the allowable optical surface tolerances associated with the mirrors and diffraction grating substrates, if the high quality beam characteristics are to be utilized. We describe some of the fabrication and metrology techniques used to attain sub-microradian slope errors and surface roughness of 2 angstroms RMS on water cooled metal components.

Citation Download Citation

David L. Lunt, Jonathan W. Bender, Donald G. Ewing, and Wayne R. McKinney "XUV synchrotron optical components for the Advanced Light Source: fabrication and metrology", Proc. SPIE 1740, Optics for High-Brightness Synchrotron Radiation Beamlines, (20 January 1993); https://doi.org/10.1117/12.138698

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available